Equipment(設(shè)備) | 詳情 |
---|---|
ALD | ALDER - 1000 |
Capacity(能力) |
Up to 45 φ300 wafers per batch (≥ 5hour per batch) 每批最多 45 φ300 個(gè)晶片(每批 ≥ 5 小時(shí)) |
Product Characteristics(產(chǎn)品特性) | 詳情 |
Substarte Material(材料) |
Resin - based, glass - based, silicone - based substrate 樹(shù)脂基、玻璃基、硅基 |
Product Type(產(chǎn)品類(lèi)型) |
Various types of flat and aspherical mirror coating; wafer coating (within 12"); Shaped structure coating 各類(lèi)平片、非球面鏡鍍膜;晶圓鍍膜(12“以?xún)?nèi));異形結(jié)構(gòu)鍍膜 |
Coating material(鍍膜材料) | SiO?, TiO?, Al?O? |
Optical properties(光學(xué)特性) | 詳情 |
Wavelength(工作波段) | 420 - 700nm |
Reflectivity(420 - 700nm)(反射(420 - 700nm)) | Rmax<0.1% |
Wide - angle(0°~40°)(大角度(0°~40°)) | Rmax<0.5% |
Appearance(外觀(guān)規(guī)格) | 詳情 |
Appearance(外觀(guān)水平) |
Surface Particle:1.0~10um 表面 Particle:1.0~10um |